Predictive modeling of mixed abrasive slurry for enhanced performance in tungsten chemical mechanical polishing: A particle number concentration approach.
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| Title: | Predictive modeling of mixed abrasive slurry for enhanced performance in tungsten chemical mechanical polishing: A particle number concentration approach. |
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| Authors: | Back, Geumji1, Oh, Seungjun2, Lee, Dongho2, Kim, Taesung1,2, tkim@skku.edu |
| Source: | Materials Science in Semiconductor Processing; Feb2026, Vol. 202, pN.PAG-N.PAG, 1p |
| Database: | Applied Science & Technology Source |
| ISSN: | 13698001 |
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| DOI: | 10.1016/j.mssp.2025.110119 |
