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Microstructure of the subsurface layer formed in monocrystalline silicon during etching with Xe+ ions investigation.

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Bibliographic Details
Title: Microstructure of the subsurface layer formed in monocrystalline silicon during etching with Xe+ ions investigation.
Authors: Mikhailenko, Mikhail S.1, mikhaylenko@ipmras.ru, Pestov, Alexey E.1, mikhaylenko@ipmras.ru, Chernyshev, Aleksei K.1, Chkhalo, Nikolay I.1, Orlova, Anastasia N.1, Zorina, Maria V.1, Kumar, Niranjan2,3, Goryainov, Sergei V.4, Volodin, Vladimir A.2,5, Nazarov, Artem A.1
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Nov2025, Vol. 43 Issue 6, p1-8, 8p
Database: Applied Science & Technology Source
Description
ISSN:07342101
DOI:10.1116/6.0004851