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Microstructure of the subsurface layer formed in monocrystalline silicon during etching with Xe+ ions investigation.

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Title: Microstructure of the subsurface layer formed in monocrystalline silicon during etching with Xe+ ions investigation.
Authors: Mikhailenko, Mikhail S.1, mikhaylenko@ipmras.ru, Pestov, Alexey E.1, mikhaylenko@ipmras.ru, Chernyshev, Aleksei K.1, Chkhalo, Nikolay I.1, Orlova, Anastasia N.1, Zorina, Maria V.1, Kumar, Niranjan2,3, Goryainov, Sergei V.4, Volodin, Vladimir A.2,5, Nazarov, Artem A.1
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Nov2025, Vol. 43 Issue 6, p1-8, 8p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 189857421
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1116/6.0004851
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      – Code: eng
        Text: English
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      – TitleFull: Microstructure of the subsurface layer formed in monocrystalline silicon during etching with Xe+ ions investigation.
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            NameFull: Mikhailenko, Mikhail S.
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            NameFull: Chernyshev, Aleksei K.
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            NameFull: Chkhalo, Nikolay I.
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            NameFull: Orlova, Anastasia N.
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            NameFull: Zorina, Maria V.
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            – D: 01
              M: 11
              Text: Nov2025
              Type: published
              Y: 2025
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              Value: 43
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            – TitleFull: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
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