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Preparation and Properties of Plasma Etching-Resistant Y 2 O 3 Films.

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Bibliographic Details
Title: Preparation and Properties of Plasma Etching-Resistant Y 2 O 3 Films.
Authors: Zhang, Rui1, Peng, Jiaxing1,2, Zhang, Xiaobo2,3, Guo, Kesheng3,4, Gao, Zecui1,4,5, Dai, Wei1, Wu, Zhengtao1,2, Xu, Yuxiang1,3, Wang, Qimin1,4,5, qmwang@gdut.edu.cn
Source: Coatings (2079-6412); Dec2025, Vol. 15 Issue 12, p1397, 21p
Database: Applied Science & Technology Source
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ISSN:20796412
DOI:10.3390/coatings15121397