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Preparation and Properties of Plasma Etching-Resistant Y 2 O 3 Films.

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Title: Preparation and Properties of Plasma Etching-Resistant Y 2 O 3 Films.
Authors: Zhang, Rui1, Peng, Jiaxing1,2, Zhang, Xiaobo2,3, Guo, Kesheng3,4, Gao, Zecui1,4,5, Dai, Wei1, Wu, Zhengtao1,2, Xu, Yuxiang1,3, Wang, Qimin1,4,5, qmwang@gdut.edu.cn
Source: Coatings (2079-6412); Dec2025, Vol. 15 Issue 12, p1397, 21p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 190529205
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PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Preparation and Properties of Plasma Etching-Resistant Y 2 O 3 Films.
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  Data: <searchLink fieldCode="JN" term="%22Coatings+%282079-6412%29%22">Coatings (2079-6412)</searchLink>; Dec2025, Vol. 15 Issue 12, p1397, 21p
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        Value: 10.3390/coatings15121397
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      – Code: eng
        Text: English
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        PageCount: 21
        StartPage: 1397
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      – TitleFull: Preparation and Properties of Plasma Etching-Resistant Y 2 O 3 Films.
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              M: 12
              Text: Dec2025
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