Cooling performance of top-side polycrystalline diamond integration in RF-power N-polar GaN high-electron-mobility transistors predicted using a robust modeling platform.

Saved in:
Bibliographic Details
Title: Cooling performance of top-side polycrystalline diamond integration in RF-power N-polar GaN high-electron-mobility transistors predicted using a robust modeling platform.
Authors: Tran, Dat Q.1, dattq@stanford.edu, Soman, Rohith1, Kim, Jeong-Kyu1, Malakoutian, Mohamadali1, Chowdhury, Srabanti1, srabanti@stanford.edu
Source: Journal of Applied Physics; 3/21/2026, Vol. 139 Issue 11, p1-9, 9p
Database: Applied Science & Technology Source
Description
ISSN:00218979
DOI:10.1063/5.0304824