RF Magnetron Sputtered Tungsten Disulfide Films: Influence of Target Preparation, Deposition Parameters, and Storage Conditions on Thin Film Stoichiometry.
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| Title: | RF Magnetron Sputtered Tungsten Disulfide Films: Influence of Target Preparation, Deposition Parameters, and Storage Conditions on Thin Film Stoichiometry. |
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| Authors: | Scheler, Theresa1,2, theresa.scheler@tu-ilmenau.de, Illgner, Pascal1,2, Kups, Thomas1,2, Blum, Michaela1,2, Schaaf, Peter1,2, peter.schaaf@tu-ilmenau.de |
| Source: | Advanced Materials Interfaces; 4/7/2026, Vol. 13 Issue 7, p1-9, 9p |
| Database: | Applied Science & Technology Source |
| ISSN: | 21967350 |
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| DOI: | 10.1002/admi.202501023 |
