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RF Magnetron Sputtered Tungsten Disulfide Films: Influence of Target Preparation, Deposition Parameters, and Storage Conditions on Thin Film Stoichiometry.

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Title: RF Magnetron Sputtered Tungsten Disulfide Films: Influence of Target Preparation, Deposition Parameters, and Storage Conditions on Thin Film Stoichiometry.
Authors: Scheler, Theresa1,2, theresa.scheler@tu-ilmenau.de, Illgner, Pascal1,2, Kups, Thomas1,2, Blum, Michaela1,2, Schaaf, Peter1,2, peter.schaaf@tu-ilmenau.de
Source: Advanced Materials Interfaces; 4/7/2026, Vol. 13 Issue 7, p1-9, 9p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 192816921
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: RF Magnetron Sputtered Tungsten Disulfide Films: Influence of Target Preparation, Deposition Parameters, and Storage Conditions on Thin Film Stoichiometry.
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  Data: <searchLink fieldCode="AU" term="%22Scheler%2C+Theresa%22">Scheler, Theresa</searchLink><relatesTo>1,2</relatesTo>, <i>theresa.scheler@tu-ilmenau.de</i><br /><searchLink fieldCode="AU" term="%22Illgner%2C+Pascal%22">Illgner, Pascal</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Kups%2C+Thomas%22">Kups, Thomas</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Blum%2C+Michaela%22">Blum, Michaela</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Schaaf%2C+Peter%22">Schaaf, Peter</searchLink><relatesTo>1,2</relatesTo>, <i>peter.schaaf@tu-ilmenau.de</i>
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  Data: <searchLink fieldCode="JN" term="%22Advanced+Materials+Interfaces%22">Advanced Materials Interfaces</searchLink>; 4/7/2026, Vol. 13 Issue 7, p1-9, 9p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=192816921
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      – Type: doi
        Value: 10.1002/admi.202501023
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      – Code: eng
        Text: English
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        PageCount: 9
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      – TitleFull: RF Magnetron Sputtered Tungsten Disulfide Films: Influence of Target Preparation, Deposition Parameters, and Storage Conditions on Thin Film Stoichiometry.
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            NameFull: Scheler, Theresa
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            NameFull: Illgner, Pascal
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            NameFull: Kups, Thomas
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            – D: 07
              M: 04
              Text: 4/7/2026
              Type: published
              Y: 2026
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              Value: 13
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