Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuration.
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| Title: | Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuration. |
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| Authors: | Wu, Xiaojian1, Dong, Shuo2, Xu, Kaidong2, Zhuang, Shiwei1, zhuangshiwei@jsnu.edu.cn |
| Source: | Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; May2026, Vol. 44 Issue 3, p1-12, 12p |
| Database: | Applied Science & Technology Source |
| ISSN: | 21662746 |
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| DOI: | 10.1116/6.0005220 |
