View in EDS

Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuration.

Saved in:
Bibliographic Details
Title: Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuration.
Authors: Wu, Xiaojian1, Dong, Shuo2, Xu, Kaidong2, Zhuang, Shiwei1, zhuangshiwei@jsnu.edu.cn
Source: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; May2026, Vol. 44 Issue 3, p1-12, 12p
Database: Applied Science & Technology Source
FullText Text:
  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 193810230
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuration.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Wu%2C+Xiaojian%22">Wu, Xiaojian</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Dong%2C+Shuo%22">Dong, Shuo</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Xu%2C+Kaidong%22">Xu, Kaidong</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhuang%2C+Shiwei%22">Zhuang, Shiwei</searchLink><relatesTo>1</relatesTo>, <i>zhuangshiwei@jsnu.edu.cn</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Journal+of+Vacuum+Science+%26+Technology%3A+Part+B-Nanotechnology+%26+Microelectronics%22">Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics</searchLink>; May2026, Vol. 44 Issue 3, p1-12, 12p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=193810230
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1116/6.0005220
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 12
        StartPage: 1
    Titles:
      – TitleFull: Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuration.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Wu, Xiaojian
      – PersonEntity:
          Name:
            NameFull: Dong, Shuo
      – PersonEntity:
          Name:
            NameFull: Xu, Kaidong
      – PersonEntity:
          Name:
            NameFull: Zhuang, Shiwei
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 05
              Text: May2026
              Type: published
              Y: 2026
          Identifiers:
            – Type: issn-print
              Value: 21662746
          Numbering:
            – Type: volume
              Value: 44
            – Type: issue
              Value: 3
          Titles:
            – TitleFull: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics
              Type: main
ResultId 1