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Fabrication optimization of suspended stencil mask lithography for multi-terminal Josephson junctions.

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Title: Fabrication optimization of suspended stencil mask lithography for multi-terminal Josephson junctions.
Authors: Teller, Justus1,2, j.teller@fz-juelich.de, Jalil, Abdur Rehman3, Lentz, Florian4, Grützmacher, Detlev1,2, Schäpers, Thomas1,2, th.schaepers@fz-juelich.de
Source: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; May2026, Vol. 44 Issue 3, p1-7, 7p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 193810237
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Fabrication optimization of suspended stencil mask lithography for multi-terminal Josephson junctions.
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=193810237
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1116/6.0005295
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 7
        StartPage: 1
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      – TitleFull: Fabrication optimization of suspended stencil mask lithography for multi-terminal Josephson junctions.
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            NameFull: Teller, Justus
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            NameFull: Jalil, Abdur Rehman
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            NameFull: Lentz, Florian
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            NameFull: Grützmacher, Detlev
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            NameFull: Schäpers, Thomas
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          Dates:
            – D: 01
              M: 05
              Text: May2026
              Type: published
              Y: 2026
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              Value: 21662746
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              Value: 44
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              Value: 3
          Titles:
            – TitleFull: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics
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