Bibliographic Details
| Title: |
Tert‐Butyl–Engineered Trinuclear Tin Complexes for High‐Sensitivity Sub‐10 Nm Patterning. |
| Authors: |
Gong, Xiaofeng1, Cong, Riyao1, Huang, Xinyan1, Zhao, Yingdong1, Wang, Daohan1, Chen, Zijian1, Zhang, Min1, Zheng, Lingfeng1, Li, Wenzheng1, Xu, Runfeng1, Zhao, Jun2, Zhu, Huie3, Lu, Zhan3, He, Jianjun3, Chen, Pengzhong1, pzchen@dlut.edu.cn, Peng, Xiaojun1,3,4, pengxj@dlut.edu.cn |
| Source: |
Advanced Functional Materials; May2026, Vol. 36 Issue 39, p1-13, 13p |
| Database: |
Applied Science & Technology Source |
