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Tert‐Butyl–Engineered Trinuclear Tin Complexes for High‐Sensitivity Sub‐10 Nm Patterning.

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Title: Tert‐Butyl–Engineered Trinuclear Tin Complexes for High‐Sensitivity Sub‐10 Nm Patterning.
Authors: Gong, Xiaofeng1, Cong, Riyao1, Huang, Xinyan1, Zhao, Yingdong1, Wang, Daohan1, Chen, Zijian1, Zhang, Min1, Zheng, Lingfeng1, Li, Wenzheng1, Xu, Runfeng1, Zhao, Jun2, Zhu, Huie3, Lu, Zhan3, He, Jianjun3, Chen, Pengzhong1, pzchen@dlut.edu.cn, Peng, Xiaojun1,3,4, pengxj@dlut.edu.cn
Source: Advanced Functional Materials; May2026, Vol. 36 Issue 39, p1-13, 13p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 193837141
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Tert‐Butyl–Engineered Trinuclear Tin Complexes for High‐Sensitivity Sub‐10 Nm Patterning.
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  Data: <searchLink fieldCode="JN" term="%22Advanced+Functional+Materials%22">Advanced Functional Materials</searchLink>; May2026, Vol. 36 Issue 39, p1-13, 13p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=193837141
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        Value: 10.1002/adfm.202531807
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        Text: English
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      – TitleFull: Tert‐Butyl–Engineered Trinuclear Tin Complexes for High‐Sensitivity Sub‐10 Nm Patterning.
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              Text: May2026
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