Plasma pretreatment to increase benzaldehyde attachment to the SiNx surface before atomic layer etching.
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| Title: | Plasma pretreatment to increase benzaldehyde attachment to the SiNx surface before atomic layer etching. |
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| Authors: | Wang, Xue1, Gasvoda, Ryan J.2, Hudson, Eric A.3, Kumar, Prabhat3, Prabhat.Kumar1@lamresearch.com, Agarwal, Sumit1, Prabhat.Kumar1@lamresearch.com |
| Source: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; May2026, Vol. 44 Issue 3, p1-9, 9p |
| Database: | Applied Science & Technology Source |
| ISSN: | 07342101 |
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| DOI: | 10.1116/6.0005274 |
