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Plasma pretreatment to increase benzaldehyde attachment to the SiNx surface before atomic layer etching.

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Title: Plasma pretreatment to increase benzaldehyde attachment to the SiNx surface before atomic layer etching.
Authors: Wang, Xue1, Gasvoda, Ryan J.2, Hudson, Eric A.3, Kumar, Prabhat3, Prabhat.Kumar1@lamresearch.com, Agarwal, Sumit1, Prabhat.Kumar1@lamresearch.com
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; May2026, Vol. 44 Issue 3, p1-9, 9p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 194305127
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Plasma pretreatment to increase benzaldehyde attachment to the SiNx surface before atomic layer etching.
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  Data: <searchLink fieldCode="AU" term="%22Wang%2C+Xue%22">Wang, Xue</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Gasvoda%2C+Ryan+J%2E%22">Gasvoda, Ryan J.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Hudson%2C+Eric+A%2E%22">Hudson, Eric A.</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Kumar%2C+Prabhat%22">Kumar, Prabhat</searchLink><relatesTo>3</relatesTo>, <i>Prabhat.Kumar1@lamresearch.com</i><br /><searchLink fieldCode="AU" term="%22Agarwal%2C+Sumit%22">Agarwal, Sumit</searchLink><relatesTo>1</relatesTo>, <i>Prabhat.Kumar1@lamresearch.com</i>
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=194305127
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1116/6.0005274
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 9
        StartPage: 1
    Titles:
      – TitleFull: Plasma pretreatment to increase benzaldehyde attachment to the SiNx surface before atomic layer etching.
        Type: main
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      – PersonEntity:
          Name:
            NameFull: Wang, Xue
      – PersonEntity:
          Name:
            NameFull: Gasvoda, Ryan J.
      – PersonEntity:
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            NameFull: Hudson, Eric A.
      – PersonEntity:
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            NameFull: Kumar, Prabhat
      – PersonEntity:
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            NameFull: Agarwal, Sumit
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          Dates:
            – D: 01
              M: 05
              Text: May2026
              Type: published
              Y: 2026
          Identifiers:
            – Type: issn-print
              Value: 07342101
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              Value: 44
            – Type: issue
              Value: 3
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            – TitleFull: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
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