Direct resist-free patterning of an organic semiconductor via thermal scanning probe lithography.
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| Title: | Direct resist-free patterning of an organic semiconductor via thermal scanning probe lithography. |
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| Authors: | Luo, Kaimin1,2, LKM@mail.sim.ac.cn, Li, Jun1, lj@mail.sim.ac.cn, Gu, Yanshu1,2, gu_yanshu@mail.sim.ac.cn, Ma, Tianlei1, matianlei@mail.sim.ac.cn, Zhang, Jingyuan1, 2511883@tongji.edu.cn, Cao, Liying1, liying_cao2026@163.com, Zhu, Zhaohui1, zhuzh@mail.sim.ac.cn, Tang, Heng1, th123@mail.sim.ac.cn, Xu, Pengcheng1,2, xpc@mail.sim.ac.cn, Jia, Hao1,2, hao.jia@mail.sim.ac.cn, Tu, Min1,3, mintu@shu.edu.cn, Li, Xinxin1,2, xxli@mail.sim.ac.cn |
| Source: | Discover Nano; 6/21/2026, Vol. 21 Issue 1, p1-11, 11p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 27319229 |
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| DOI: | 10.1186/s11671-026-04658-8 |
