Constrained Dynamic Time Warping and Polyline Distance for Anomaly Detection in Semiconductor Manufacturing.
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| Title: | Constrained Dynamic Time Warping and Polyline Distance for Anomaly Detection in Semiconductor Manufacturing. |
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| Authors: | Li, Gangjiang1, Hang, Yihong2, Yang, Zaizhou1,2, Yang, Zhice2, yangzhc@shanghaitech.edu.cn |
| Source: | Applied Sciences (2076-3417); Jun2026, Vol. 16 Issue 12, p5779, 17p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 20763417 |
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| DOI: | 10.3390/app16125779 |
