APA (7th ed.) Citation

Li, G., Hang, Y., Yang, Z., & Yang, Z. (2026). Constrained Dynamic Time Warping and Polyline Distance for Anomaly Detection in Semiconductor Manufacturing. Applied Sciences (2076-3417), 16(12), 5779. https://doi.org/10.3390/app16125779

Chicago Style (17th ed.) Citation

Li, Gangjiang, Yihong Hang, Zaizhou Yang, and Zhice Yang. "Constrained Dynamic Time Warping and Polyline Distance for Anomaly Detection in Semiconductor Manufacturing." Applied Sciences (2076-3417) 16, no. 12 (2026): 5779. https://doi.org/10.3390/app16125779.

MLA (9th ed.) Citation

Li, Gangjiang, et al. "Constrained Dynamic Time Warping and Polyline Distance for Anomaly Detection in Semiconductor Manufacturing." Applied Sciences (2076-3417), vol. 16, no. 12, 2026, p. 5779, https://doi.org/10.3390/app16125779.