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Constrained Dynamic Time Warping and Polyline Distance for Anomaly Detection in Semiconductor Manufacturing.

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Title: Constrained Dynamic Time Warping and Polyline Distance for Anomaly Detection in Semiconductor Manufacturing.
Authors: Li, Gangjiang1, Hang, Yihong2, Yang, Zaizhou1,2, Yang, Zhice2, yangzhc@shanghaitech.edu.cn
Source: Applied Sciences (2076-3417); Jun2026, Vol. 16 Issue 12, p5779, 17p
Database: Applied Science & Technology Source
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  Data: Constrained Dynamic Time Warping and Polyline Distance for Anomaly Detection in Semiconductor Manufacturing.
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  Data: <searchLink fieldCode="AU" term="%22Li%2C+Gangjiang%22">Li, Gangjiang</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Hang%2C+Yihong%22">Hang, Yihong</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Yang%2C+Zaizhou%22">Yang, Zaizhou</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Yang%2C+Zhice%22">Yang, Zhice</searchLink><relatesTo>2</relatesTo>, <i>yangzhc@shanghaitech.edu.cn</i>
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        Value: 10.3390/app16125779
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      – Code: eng
        Text: English
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        PageCount: 17
        StartPage: 5779
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      – TitleFull: Constrained Dynamic Time Warping and Polyline Distance for Anomaly Detection in Semiconductor Manufacturing.
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            NameFull: Li, Gangjiang
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            NameFull: Hang, Yihong
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            NameFull: Yang, Zaizhou
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              Text: Jun2026
              Type: published
              Y: 2026
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