APA (7th ed.) Citation

Xie, W., Wu, J., Wang, Y., & Chen, Y. (2026). S2GA-VM: Self-supervised and global-aware virtual metrology for accurate film thickness prediction in semiconductor manufacturing. Journal of Intelligent Manufacturing, 37(8), 3235. https://doi.org/10.1007/s10845-025-02683-5

Chicago Style (17th ed.) Citation

Xie, Weiping, Jiangchen Wu, Yuping Wang, and Yining Chen. "S2GA-VM: Self-supervised and Global-aware Virtual Metrology for Accurate Film Thickness Prediction in Semiconductor Manufacturing." Journal of Intelligent Manufacturing 37, no. 8 (2026): 3235. https://doi.org/10.1007/s10845-025-02683-5.

MLA (9th ed.) Citation

Xie, Weiping, et al. "S2GA-VM: Self-supervised and Global-aware Virtual Metrology for Accurate Film Thickness Prediction in Semiconductor Manufacturing." Journal of Intelligent Manufacturing, vol. 37, no. 8, 2026, p. 3235, https://doi.org/10.1007/s10845-025-02683-5.