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Effect of different frequency combination on ArF photoresist deformation and silicon dioxide etching in the dual frequency superimposed capacitively coupled plasmas.

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Bibliographic Details
Title: Effect of different frequency combination on ArF photoresist deformation and silicon dioxide etching in the dual frequency superimposed capacitively coupled plasmas.
Authors: Lee, C. H.1,2, nelee@skku.edu, Kim, D. H.3, Lee, N.-E.1,2, Kwon, G. C.3
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2006, Vol. 24 Issue 4, p1386-1394, 9p, 3 Black and White Photographs, 6 Graphs
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 23073889
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Effect of different frequency combination on ArF photoresist deformation and silicon dioxide etching in the dual frequency superimposed capacitively coupled plasmas.
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  Data: <searchLink fieldCode="AU" term="%22Lee%2C+C%2E+H%2E%22">Lee, C. H.</searchLink><relatesTo>1,2</relatesTo>, <i>nelee@skku.edu</i><br /><searchLink fieldCode="AU" term="%22Kim%2C+D%2E+H%2E%22">Kim, D. H.</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Lee%2C+N%2E-E%2E%22">Lee, N.-E.</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Kwon%2C+G%2E+C%2E%22">Kwon, G. C.</searchLink><relatesTo>3</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Vacuum+Science+%26+Technology%3A+Part+A-Vacuums%2C+Surfaces+%26+Films%22">Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films</searchLink>; Jul2006, Vol. 24 Issue 4, p1386-1394, 9p, 3 Black and White Photographs, 6 Graphs
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=23073889
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1116/1.2201059
    Languages:
      – Code: eng
        Text: English
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      Pagination:
        PageCount: 9
        StartPage: 1386
    Titles:
      – TitleFull: Effect of different frequency combination on ArF photoresist deformation and silicon dioxide etching in the dual frequency superimposed capacitively coupled plasmas.
        Type: main
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      – PersonEntity:
          Name:
            NameFull: Lee, C. H.
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          Name:
            NameFull: Kim, D. H.
      – PersonEntity:
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            NameFull: Lee, N.-E.
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            NameFull: Kwon, G. C.
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          Dates:
            – D: 01
              M: 07
              Text: Jul2006
              Type: published
              Y: 2006
          Identifiers:
            – Type: issn-print
              Value: 07342101
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            – Type: volume
              Value: 24
            – Type: issue
              Value: 4
          Titles:
            – TitleFull: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
              Type: main
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