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Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch.

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Bibliographic Details
Title: Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch.
Authors: Eih-Zhe Liang1, Chao-Jei Huang1, Ching-Fuh Lin1,2,3, cflin@cc.ee.ntu.edu.tw
Source: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Mar/Apr2006, Vol. 24 Issue 2, p599-603, 5p, 3 Black and White Photographs, 1 Diagram, 2 Graphs
Database: Applied Science & Technology Source
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