Quenched-in defect removal through silicide formation by rapid thermal processing.
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| Title: | Quenched-in defect removal through silicide formation by rapid thermal processing. |
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| Authors: | Mathiot, Daniel |
| Source: | Applied Physics Letters; 1/14/1991, Vol. 58 Issue 2, p131, 3p, 1 Chart, 2 Graphs |
| Database: | Applied Science & Technology Source |
| ISSN: | 00036951 |
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| DOI: | 10.1063/1.104950 |
