Atomistic modeling of defect diffusion and interdiffusion in SiGe heterostructures

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Bibliographic Details
Title: Atomistic modeling of defect diffusion and interdiffusion in SiGe heterostructures
Authors: Castrillo, P., pedcas@tel.uva.es, Jaraiz, M.1, Pinacho, R.1, Rubio, J.E.1
Source: Thin Solid Films; Feb2010, Vol. 518 Issue 9, p2448-2453, 6p
Database: Applied Science & Technology Source
Description
ISSN:00406090
DOI:10.1016/j.tsf.2009.10.113