APA (7th ed.) Citation

Castrillo, P., Jaraiz, M., Pinacho, R., & Rubio, J. (2010). Atomistic modeling of defect diffusion and interdiffusion in SiGe heterostructures. Thin Solid Films, 518(9), 2448. https://doi.org/10.1016/j.tsf.2009.10.113

Chicago Style (17th ed.) Citation

Castrillo, P., M. Jaraiz, R. Pinacho, and J.E Rubio. "Atomistic Modeling of Defect Diffusion and Interdiffusion in SiGe Heterostructures." Thin Solid Films 518, no. 9 (2010): 2448. https://doi.org/10.1016/j.tsf.2009.10.113.

MLA (9th ed.) Citation

Castrillo, P., et al. "Atomistic Modeling of Defect Diffusion and Interdiffusion in SiGe Heterostructures." Thin Solid Films, vol. 518, no. 9, 2010, p. 2448, https://doi.org/10.1016/j.tsf.2009.10.113.