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Atomistic modeling of defect diffusion and interdiffusion in SiGe heterostructures

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Title: Atomistic modeling of defect diffusion and interdiffusion in SiGe heterostructures
Authors: Castrillo, P., pedcas@tel.uva.es, Jaraiz, M.1, Pinacho, R.1, Rubio, J.E.1
Source: Thin Solid Films; Feb2010, Vol. 518 Issue 9, p2448-2453, 6p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 48118654
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Atomistic modeling of defect diffusion and interdiffusion in SiGe heterostructures
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  Data: <searchLink fieldCode="AU" term="%22Castrillo%2C+P%2E%22">Castrillo, P.</searchLink>, <i>pedcas@tel.uva.es</i><br /><searchLink fieldCode="AU" term="%22Jaraiz%2C+M%2E%22">Jaraiz, M.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Pinacho%2C+R%2E%22">Pinacho, R.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Rubio%2C+J%2EE%2E%22">Rubio, J.E.</searchLink><relatesTo>1</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Thin+Solid+Films%22">Thin Solid Films</searchLink>; Feb2010, Vol. 518 Issue 9, p2448-2453, 6p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=48118654
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1016/j.tsf.2009.10.113
    Languages:
      – Code: eng
        Text: English
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        PageCount: 6
        StartPage: 2448
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      – TitleFull: Atomistic modeling of defect diffusion and interdiffusion in SiGe heterostructures
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            NameFull: Castrillo, P.
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            NameFull: Jaraiz, M.
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            NameFull: Pinacho, R.
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            NameFull: Rubio, J.E.
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              Text: Feb2010
              Type: published
              Y: 2010
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              Value: 518
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              Value: 9
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