Plasma-enhanced chemical vapor deposition of organosilicon thin films from tetraethoxysilane-oxygen feeds.
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| Title: | Plasma-enhanced chemical vapor deposition of organosilicon thin films from tetraethoxysilane-oxygen feeds. |
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| Authors: | Fracassi, F., d'Agostino, R., Favia, P. |
| Source: | Journal of the Electrochemical Society; September 1992, Vol. 139, p2636-2644, 9p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.2221277 |
