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Plasma-enhanced chemical vapor deposition of organosilicon thin films from tetraethoxysilane-oxygen feeds.

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Bibliographic Details
Title: Plasma-enhanced chemical vapor deposition of organosilicon thin films from tetraethoxysilane-oxygen feeds.
Authors: Fracassi, F., d'Agostino, R., Favia, P.
Source: Journal of the Electrochemical Society; September 1992, Vol. 139, p2636-2644, 9p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500029762
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Plasma-enhanced chemical vapor deposition of organosilicon thin films from tetraethoxysilane-oxygen feeds.
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  Data: <searchLink fieldCode="AU" term="%22Fracassi%2C+F%2E%22">Fracassi, F.</searchLink><br /><searchLink fieldCode="AU" term="%22d'Agostino%2C+R%2E%22">d'Agostino, R.</searchLink><br /><searchLink fieldCode="AU" term="%22Favia%2C+P%2E%22">Favia, P.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+the+Electrochemical+Society%22">Journal of the Electrochemical Society</searchLink>; September 1992, Vol. 139, p2636-2644, 9p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500029762
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1149/1.2221277
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 9
        StartPage: 2636
    Titles:
      – TitleFull: Plasma-enhanced chemical vapor deposition of organosilicon thin films from tetraethoxysilane-oxygen feeds.
        Type: main
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            NameFull: Fracassi, F.
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            NameFull: d'Agostino, R.
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            NameFull: Favia, P.
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            – D: 01
              M: 09
              Text: September 1992
              Type: published
              Y: 1992
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              Value: 00134651
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            – Type: volume
              Value: 139
          Titles:
            – TitleFull: Journal of the Electrochemical Society
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