Degradation and subsequent healing by electromigration in Al-1 wt % Si thin films.

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Bibliographic Details
Title: Degradation and subsequent healing by electromigration in Al-1 wt % Si thin films.
Authors: Li, Z., Bauer, C. L., Mahajan, S.
Source: Journal of Applied Physics; September 1 1992, Vol. 72, p1821-1832, 12p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500030936
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Degradation and subsequent healing by electromigration in Al-1 wt % Si thin films.
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1063/1.351653
    Languages:
      – Code: eng
        Text: English
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        PageCount: 12
        StartPage: 1821
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      – TitleFull: Degradation and subsequent healing by electromigration in Al-1 wt % Si thin films.
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            NameFull: Li, Z.
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            NameFull: Bauer, C. L.
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            NameFull: Mahajan, S.
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            – D: 01
              M: 09
              Text: September 1 1992
              Type: published
              Y: 1992
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              Value: 72
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