Reactive ion-plating at low ion energies with an unbalanced magnetron.
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| Title: | Reactive ion-plating at low ion energies with an unbalanced magnetron. |
|---|---|
| Authors: | Howson, R. P., Ja'fer, H. A., Spencer, A. G. |
| Source: | Vacuum; March-April 1993, Vol. 44, p191-195, 5p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 500095992 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500095992 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/0042-207X(93)90152-Z Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 5 StartPage: 191 Titles: – TitleFull: Reactive ion-plating at low ion energies with an unbalanced magnetron. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Howson, R. P. – PersonEntity: Name: NameFull: Ja'fer, H. A. – PersonEntity: Name: NameFull: Spencer, A. G. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 03 Text: March-April 1993 Type: published Y: 1993 Identifiers: – Type: issn-print Value: 0042207X Numbering: – Type: volume Value: 44 Titles: – TitleFull: Vacuum Type: main |
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