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On-line inference of plasma etch uniformity using in situ ellipsometry.

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Bibliographic Details
Title: On-line inference of plasma etch uniformity using in situ ellipsometry.
Authors: Stefani, Jerry, Butler, Stephanie Watts
Source: Journal of the Electrochemical Society; May 1994, Vol. 141, p1387-1391, 5p
Database: Applied Science & Technology Source
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