Stoichiometry reversal in the growth of thin oxynitride films on Si(100) surfaces.
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| Title: | Stoichiometry reversal in the growth of thin oxynitride films on Si(100) surfaces. |
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| Authors: | Sutherland, D. G. J., Akatsu, H., Copel, M. |
| Source: | Journal of Applied Physics; December 1 1995, Vol. 78, p6761-6769, 9p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.360500 |
