Plasma assisted dry etching of cobalt silicide for microelectronics applications.
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| Title: | Plasma assisted dry etching of cobalt silicide for microelectronics applications. |
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| Authors: | Fracassi, F., d'Agostino, R., Lamendola, R. |
| Source: | Journal of the Electrochemical Society; February 1996, Vol. 143, p701-707, 7p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.1836504 |
