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Plasma assisted dry etching of cobalt silicide for microelectronics applications.

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Bibliographic Details
Title: Plasma assisted dry etching of cobalt silicide for microelectronics applications.
Authors: Fracassi, F., d'Agostino, R., Lamendola, R.
Source: Journal of the Electrochemical Society; February 1996, Vol. 143, p701-707, 7p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500271467
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Plasma assisted dry etching of cobalt silicide for microelectronics applications.
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  Data: <searchLink fieldCode="AU" term="%22Fracassi%2C+F%2E%22">Fracassi, F.</searchLink><br /><searchLink fieldCode="AU" term="%22d'Agostino%2C+R%2E%22">d'Agostino, R.</searchLink><br /><searchLink fieldCode="AU" term="%22Lamendola%2C+R%2E%22">Lamendola, R.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+the+Electrochemical+Society%22">Journal of the Electrochemical Society</searchLink>; February 1996, Vol. 143, p701-707, 7p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500271467
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1149/1.1836504
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      – Code: eng
        Text: English
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        PageCount: 7
        StartPage: 701
    Titles:
      – TitleFull: Plasma assisted dry etching of cobalt silicide for microelectronics applications.
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          Name:
            NameFull: Fracassi, F.
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            NameFull: d'Agostino, R.
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            NameFull: Lamendola, R.
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            – D: 01
              M: 02
              Text: February 1996
              Type: published
              Y: 1996
          Identifiers:
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              Value: 00134651
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              Value: 143
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            – TitleFull: Journal of the Electrochemical Society
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