O interstitial generation and diffusion in high temperature annealed Si/SiO2/Si structures.
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| Title: | O interstitial generation and diffusion in high temperature annealed Si/SiO2/Si structures. |
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| Authors: | Devine, R. A. B., Mathiot, D., Warren, W. L. |
| Source: | Journal of Applied Physics; March 1 1996, Vol. 79, p2302-2308, 7p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.361155 |
