APA (7th ed.) Citation

Devine, R. A. B., Mathiot, D., & Warren, W. L. (1996). O interstitial generation and diffusion in high temperature annealed Si/SiO2/Si structures. Journal of Applied Physics, 79, 2302. https://doi.org/10.1063/1.361155

Chicago Style (17th ed.) Citation

Devine, R. A. B., D. Mathiot, and W. L. Warren. "O Interstitial Generation and Diffusion in High Temperature Annealed Si/SiO2/Si Structures." Journal of Applied Physics 79 (1996): 2302. https://doi.org/10.1063/1.361155.

MLA (9th ed.) Citation

Devine, R. A. B., et al. "O Interstitial Generation and Diffusion in High Temperature Annealed Si/SiO2/Si Structures." Journal of Applied Physics, vol. 79, 1996, p. 2302, https://doi.org/10.1063/1.361155.