Temperature dependence of the biaxial modulus, intrinsic stress and composition of plasma deposited silicon oxynitride films.
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| Title: | Temperature dependence of the biaxial modulus, intrinsic stress and composition of plasma deposited silicon oxynitride films. |
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| Authors: | Harding, David R., Ogbuji, Linus U. T., Freeman, Mathieu J. |
| Source: | Journal of Applied Physics; August 1 1995, Vol. 78, p1673-1680, 8p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.360263 |
