APA (7th ed.) Citation

Harding, D. R., Ogbuji, L. U. T., & Freeman, M. J. (1995). Temperature dependence of the biaxial modulus, intrinsic stress and composition of plasma deposited silicon oxynitride films. Journal of Applied Physics, 78, 1673. https://doi.org/10.1063/1.360263

Chicago Style (17th ed.) Citation

Harding, David R., Linus U. T. Ogbuji, and Mathieu J. Freeman. "Temperature Dependence of the Biaxial Modulus, Intrinsic Stress and Composition of Plasma Deposited Silicon Oxynitride Films." Journal of Applied Physics 78 (1995): 1673. https://doi.org/10.1063/1.360263.

MLA (9th ed.) Citation

Harding, David R., et al. "Temperature Dependence of the Biaxial Modulus, Intrinsic Stress and Composition of Plasma Deposited Silicon Oxynitride Films." Journal of Applied Physics, vol. 78, 1995, p. 1673, https://doi.org/10.1063/1.360263.