Properties of interface states at Ta2O5/n-Si interfaces.

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Title: Properties of interface states at Ta2O5/n-Si interfaces.
Authors: Zhang, S. K., Fu, Z. W., Ke, L.
Source: Journal of Applied Physics; July 1 1998, Vol. 84 Issue 1, p335-338, 4p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500393548
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PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Properties of interface states at Ta2O5/n-Si interfaces.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; July 1 1998, Vol. 84 Issue 1, p335-338, 4p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500393548
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1063/1.368032
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      – Code: eng
        Text: English
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        PageCount: 4
        StartPage: 335
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      – TitleFull: Properties of interface states at Ta2O5/n-Si interfaces.
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            NameFull: Zhang, S. K.
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            NameFull: Fu, Z. W.
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            NameFull: Ke, L.
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              Text: July 1 1998
              Type: published
              Y: 1998
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              Value: 84
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