In situ selective etching of GaAs for improving (Al)GaAs interfaces using tris-dimethylaminoarsenic.

Saved in:
Bibliographic Details
Title: In situ selective etching of GaAs for improving (Al)GaAs interfaces using tris-dimethylaminoarsenic.
Authors: Li, N. Y., Hsin, Y. M., Bi, W. G.
Source: Applied Physics Letters; May 12 1997, Vol. 70, p2589-2591, 3p
Database: Applied Science & Technology Source
Description
ISSN:00036951
DOI:10.1063/1.119087