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Development of a locally-electron-heated plasma source for HDP-CVD process.

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Bibliographic Details
Title:	Development of a locally-electron-heated plasma source for HDP-CVD process.
Authors:	Seki, H., Ueno, Y., Ichimura, S.
Source:	Vacuum; December 1998, Vol. 51 Issue 4, p695-697, 3p
Database:	Applied Science & Technology Source

Description
ISSN:	0042207X
DOI:	10.1016/S0042-207X(98)00278-4