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Development of a locally-electron-heated plasma source for HDP-CVD process.

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Bibliographic Details
Title: Development of a locally-electron-heated plasma source for HDP-CVD process.
Authors: Seki, H., Ueno, Y., Ichimura, S.
Source: Vacuum; December 1998, Vol. 51 Issue 4, p695-697, 3p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500456074
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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        Value: 10.1016/S0042-207X(98)00278-4
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        Text: English
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      – TitleFull: Development of a locally-electron-heated plasma source for HDP-CVD process.
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            NameFull: Seki, H.
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            NameFull: Ueno, Y.
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              M: 12
              Text: December 1998
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              Y: 1998
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