The impact of in situ photoexcitation on the formation of vacancy-type complexes in silicon implanted at 85 and 295K.

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Bibliographic Details
Title: The impact of in situ photoexcitation on the formation of vacancy-type complexes in silicon implanted at 85 and 295K.
Authors: Varykin, N., Cho, C. R., Rozgonyi, G. A.
Source: Applied Physics Letters; July 12 1999, Vol. 75 Issue 2, p241-243, 3p
Database: Applied Science & Technology Source
Description
ISSN:00036951
DOI:10.1063/1.124335