Improvement in buried silicon nitride silicon-on-insulator structures by fluorine-ion implantation.

Saved in:
Bibliographic Details
Title: Improvement in buried silicon nitride silicon-on-insulator structures by fluorine-ion implantation.
Authors: Rauthan, C. M. S., Virdi, G. S., Pathak, B. C.
Source: Journal of Applied Physics; April 1 1998, Vol. 83 Issue 7, p3668-3677, 10p
Database: Applied Science & Technology Source
Description
ISSN:00218979
DOI:10.1063/1.366587