Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films.
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| Title: | Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films. |
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| Authors: | Ang, C. H., Ling, C. H., Cheng, Z. Y. |
| Source: | Journal of the Electrochemical Society; December 2000, Vol. 147 Issue 12, p4676-4682, 7p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.1394122 |
