Fabrication of semiconductor nanostructures by nanoindentation of photoresist layers using atomic force microscopy.

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Bibliographic Details
Title: Fabrication of semiconductor nanostructures by nanoindentation of photoresist layers using atomic force microscopy.
Authors: Wiesauer, K., Springholz, G.
Source: Journal of Applied Physics; December 15 2000, Vol. 88 Issue 12, p7289-7297, 9p
Database: Applied Science & Technology Source
Description
ISSN:00218979
DOI:10.1063/1.1324693