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Fabrication of semiconductor nanostructures by nanoindentation of photoresist layers using atomic force microscopy.

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Title: Fabrication of semiconductor nanostructures by nanoindentation of photoresist layers using atomic force microscopy.
Authors: Wiesauer, K., Springholz, G.
Source: Journal of Applied Physics; December 15 2000, Vol. 88 Issue 12, p7289-7297, 9p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
An: 500667440
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PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Fabrication of semiconductor nanostructures by nanoindentation of photoresist layers using atomic force microscopy.
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  Data: <searchLink fieldCode="AU" term="%22Wiesauer%2C+K%2E%22">Wiesauer, K.</searchLink><br /><searchLink fieldCode="AU" term="%22Springholz%2C+G%2E%22">Springholz, G.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; December 15 2000, Vol. 88 Issue 12, p7289-7297, 9p
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        Value: 10.1063/1.1324693
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      – Code: eng
        Text: English
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        PageCount: 9
        StartPage: 7289
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      – TitleFull: Fabrication of semiconductor nanostructures by nanoindentation of photoresist layers using atomic force microscopy.
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            NameFull: Wiesauer, K.
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              Text: December 15 2000
              Type: published
              Y: 2000
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