Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?
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| Title: | Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors? |
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| Authors: | Kugler, C., Bauer, F., Laimer, J., Störi, H. |
| Source: | Vacuum; May 14 2001, Vol. 61 Issue 2/4, p379-383, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 0042207X |
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| DOI: | 10.1016/S0042-207X(01)00148-8 |
