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Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?

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Title: Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?
Authors: Kugler, C., Bauer, F., Laimer, J., Störi, H.
Source: Vacuum; May 14 2001, Vol. 61 Issue 2/4, p379-383, 5p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500742858
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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        Value: 10.1016/S0042-207X(01)00148-8
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      – Code: eng
        Text: English
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      – TitleFull: Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?
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              Text: May 14 2001
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              Value: 61
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