View in EDS

Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?

Saved in:
Bibliographic Details
Title: Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?
Authors: Kugler, C., Bauer, F., Laimer, J., Störi, H.
Source: Vacuum; May 14 2001, Vol. 61 Issue 2/4, p379-383, 5p
Database: Applied Science & Technology Source
Be the first to leave a comment!
You must be logged in first